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Review of technology for 157-nm lithography |
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by A. K. Bates, M. Rothschild, T. M. Bloomstein, T. H. Fedynyshyn, R. R. Kunz, V. Liberman, M. Switkes
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This paper outlines the critical issues facing the implementation of 157-nm lithography as a sub-100-nm technology. The status of the present technology for mask materials, pellicles, optical materials, coatings, and resists is presented. |
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| Related Subjects: Chemical analysis; Lithography; Masks; Photoresists |
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