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IBM Journal of Research and Development  
Volume 15, Number 6, Page 430 (1971)
Nontopical Issue
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A Self-Isolation Scheme for Integrated Circuits

by M. B. Vora
A self-isolation scheme is proposed for fabricating transistors in semiconductor integrated circuits. Such integrated circuits with double-diffused transistors require three diffusions and one epitaxial layer in the proposed process. Since no isolation or reach-through diffusions are involved, this technique could reduce the area of a memory or logic cell by 50% or more.
Related Subjects: Physics, solid state; Semiconductors