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2007	Polymer self assembly in semiconductor microelectronics
2001	Chemical and physical aspects of the post-exposure baking process used for positive-tone chemically amplified resists
2001	Conducting polymers in microelectronics
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2001	Printing meets lithography: Soft approaches to high-resolution patterning
2001	Review of technology for 157-nm lithography
2001	TCAD development for lithography resolution enhancement
2000	Chemical amplification resists: History and development within IBM
2000	Low-energy electron microscopy
2000	The future of CMOS technology
1997	Advanced DUV photolithography in a pilot lineenvironment
1997	Chemical amplification resists: History and development within IBM
1997	High-numerical-aperture optical designs
1997	Impact of lens aberrations on optical lithography
1997	Large-field scanning laser ablation system
1997	Laser release process to obtain freestanding multilayer metal-polyimide circuits
1997	Lithography at a wavelength of 193 nm
1997	Lithography beyond light: Microcontact printing with monolayer resists
1997	Manufacturing with DUV lithography
1997	Masks for laser ablation technology: New requirements and challenges
1997	Negative photoresists for optical lithography
1997	Optical lithography: Introduction
1997	Photoresists for 193-nm lithography
1997	Thin-film imaging: Past, present, prognosis
1995	CMOS scaling in the 0.1-μm, 1.X-volt regime for high-performance applications
1995	CMOS scaling into the 21st century: 0.1 μm and beyond
1995	Overview of gate linewidth control in the manufacture of CMOS logic chips
1995	The evolution of IBM CMOS DRAM technology
1992	A statistical approach to quality control of non-normal lithographical overlay distributions
1992	Advancing the state of the art in high-performance logic and array technology
1990	Thermoelastic behavior of X-ray lithography masks during irradiation
1984	Modeling of defects in integrated circuit photolithographic patterns
1984	Resist profile control in E-beam lithography
1982	Electron-Beam Proximity Printing—A New High-Speed Lithography Method for Submicron Structures
1982	Feature Size Control in IC Manufacturing
1982	Laser-Enhanced Chemical Etching of Solid Surfaces
1982	Laser-Enhanced Plating and Etching: Mechanisms and Applications
1982	Metrology in Mask Manufacturing
1982	The Mechanism of Single-Step Liftoff with Chlorobenzene in a Diazo-Type Resist
1982	Ultrafast High-Resolution Contact Lithography with Excimer Lasers
1981	Pi-Donor Intercalate Polymers: Synthesis, Charge-Transfer Interactions, and Applications
1980	Computer Simulation of Electron-Beam Resist Profiles
1980	Overlay in Lithography
1980	Pattern Partitioning for Enhanced Proximity-Effect Corrections in Electron-Beam Lithography
1980	Proximity Correction Enhancements for 1-μm Dense Circuits
1980	Proximity Effects in Electron Lithography: Magnitude and Correction Techniques
1980	Registration Mark Detection for Electron-Beam Lithography—EL1 System
1980	Single-Step Optical Lift-Off Process
1979	Photochemical Decomposition Mechanisms for AZ-Type Photoresists
1979	Some Chemical Aspects of the Fluorocarbon Plasma Etching of Silicon and Its Compounds
1977	Automatic Registration in an Electron-Beam Lithographic System
1977	Electron Optics of an Electron-Beam Lithographic System
1976	Deep-UV Conformable-Contact Photolithography for Bubble Circuits
1976	Scanning Electron Beam Lithography for Fabrication of Magnetic Bubble Circuits
1974	Photolithography in Integrated Circuit Mask Metrology