IBM Journal of Research and Development
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IBM Journal of Research and Development

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Related Papers
2006Continuous MOSFET performance increase with device scaling: The role of strain and channel material innovations
2006Optimizing CMOS technology for maximum performance
2006Ultralow-voltage, minimum-energy CMOS
2003SiON high-refractive-index waveguide and planar lightwave circuits
2000Low-temperature Si and Si:Ge epitaxy by ultrahigh vacuum/chemical vapor deposition: Process fundamentals
2000The future of CMOS technology
1999Cost-effective cleaning and high-quality thin gate oxides
1999Modeling and simulation methods for plasma processing
1999Nitrided gate oxides for 3.3-V logic application: Reliability and device design considerations
1999Plasma-assisted chemical vapor deposition of dielectric thin films for ULSI semiconductor circuits
1999Plasma-assisted oxidation, anodization, and nitridation of silicon
1999Plasma-etching processes for ULSI semiconductor circuits
1999Plasma processing damage in etching and deposition
1999Sputter deposition for semiconductor manufacturing
1995A 64Kb × 32 DRAM for graphics applications
1995A low-noise TTL-compatible CMOS off-chip driver circuit
1995CMOS circuits for Gb/s serial data communication
1995Custom design of CMOS low-power high-performance digital signal-processing macro for hard-disk-drive applications
1995Design at the system level with VLSI CMOS
1995Digital delay line clock shapers and multipliers
1995Electromigration and stress-induced voiding in fine Al and Al-alloy thin-film lines
1995Interconnect fabrication processes and the development of low-cost wiring for CMOS products
1995Low-temperature chemical vapor deposition processes and dielectrics for microelectronic circuit manufacturing at IBM
1995Multipurpose DRAM architecture for optimal power, performance, and product flexibility
1995Overview of gate linewidth control in the manufacture of CMOS logic chips
1995Performance of fiber-optic data links using 670-nm cw VCSELs and a monolithic Si photodetector and CMOS preamplifier
1995Silicides and local interconnections for high-performance VLSI applications
1995The evolution of IBM CMOS DRAM technology
1995VLSI on-chip interconnection performance simulations and measurements
1993Flexible simulation of a complex semiconductor manufacturing line using a rule-based system
1992A single-chip IBM System/390 floating-point processor in CMOS
1992Advancing the state of the art in high-performance logic and array technology
1992Directory and Trace memory chip with active discharge cell
1992Reactive ion etching technology in thin-film-transistor processing
1992Unique design concepts in GF11 and their impact on performance
1991A 128Kb CMOS static random-access memory
1991A 3072 × 32-stage TDI imaging device
1991An adder design optimized for DCS logic
1991Differential current switch-High performance at low power
1991Visual interpretation of multidimensional computations and transistor design
1991Visualization in a VLSI design automation system
1990Low-temperature Si and Si:Ge epitaxy by ultrahigh-vacuum/chemical vapor deposition: Process fundamentals
1990Selective epitaxial growth of silicon and some potential applications
1988Physical limits to the useful packaging density of electronic systems
1988The kinetics of fast steps on crystal surfaces and its application to the molecular beam epitaxy of silicon
1987Contact metallurgy development for VLSI logic
1987Correlation analysis of particle clusters on integrated circuit wafers
1987Electrical and microstructural investigation of polysilicon emitter contacts for high-performance bipolar VLSI
1987Study of contact and shallow junction characteristics in submicron CMOS with self-aligned titanium silicide
1986On yield, fault distributions, and clustering of particles
1985Advanced bipolar transistor modeling: Process and device simulation tools for today's technology
1985An experimental comparison of the head/disk interface dynamics in 5¼- and 8-inch disk drives
1985Animation and 3D color display of multiple-variable data: Application to semiconductor design
1985FEDSS—A 2D semiconductor fabrication process simulator
1985Semiconductor device simulation using generalized mobility models
1985The effects of wafer to wafer defect density variations on integrated circuit defect and fault distributions
1985The generation of three-dimensional bipolar transistor models for circuit analysis
1985Two-dimensional device simulation program: 2DP
1985Two-dimensional process modeling: A description of the SAFEPRO program
1985VLSI wiring capacitance
1984Modeling of defects in integrated circuit photolithographic patterns
1984Resist profile control in E-beam lithography
1982Modification of Semiconductor Device Characteristics by Lasers
1982Optimization of Plasma Processing for Silicon-Gate FET Manufacturing Applications
1982Oxygen Incorporation and Precipitation in Czochralski-Grown Silicon
1982Process Control of the Chlorobenzene Single-Step Liftoff Process with a Diazo-Type Resist
1982The Mechanism of Single-Step Liftoff with Chlorobenzene in a Diazo-Type Resist
1981A Magnetic Sensor Utilizing an Avalanching Semiconductor Device
1981Semiconductor Analysis Using Finite Elements—Part I: Computational Aspects
1981Semiconductor Logic Technology in IBM
1981Semiconductor Manufacturing in IBM, 1957 to the Present: A Perspective
1981Semiconductors at IBM: Physics, Novel Devices, and Materials Science
1981Solid State Memory Development in IBM
1981Statistics of Breakdown
19801/N Circuit and Device Technology
1980A 256K-Bit Charge-Coupled Device Memory
1980A 64K FET Dynamic Random Access Memory: Design Considerations and Description
1980A Charge Injection Transistor Memory Cell
1980A Contactless Method for High-Sensitivity Measurement of p-n Junction Leakage
1980A One-Device Memory Cell Using a Single Layer of Polysilicon and a Self-Registering Metal-to-Polysilicon Contact
1980A Silicon and Aluminum Dynamic Memory Technology
1980Circuit Implementation of Fusible Redundant Addresses on RAMs for Productivity Enhancement
1980Cross-Coupled Charge-Transfer Sense Amplifier and Latch Sense Scheme for High-Density FET Memories
1980Defect-Related Breakdown and Conduction in SiO2
1980Implanted Source/Drain Junctions for Polysilicon Gate Technologies
1980Near-Ideal Si–SiO2 Interfaces
1980Reduction of Leakage by Implantation Gettering in VLSI Circuits
1980Registration Mark Detection for Electron-Beam Lithography—EL1 System
1980Reliability of SiO2 Gate Dielectric with Semi-Recessed Oxide Isolation
1980Silicon Torsional Scanning Mirror
1980Single-Step Optical Lift-Off Process
1980VLSI Device Phenomena in Dynamic Memory and Their Application to Technology Development and Device Design
1980Yield Model for Productivity Optimization of VLSI Memory Chips with Redundancy and Partially Good Product
1979GaAs/(GaAl)As Laser Technology
1979Geometry Effects of Small MOSFET Devices
1979Some Chemical Aspects of the Fluorocarbon Plasma Etching of Silicon and Its Compounds
1979Stability of Lateral pnp Transistors During Accelerated Aging
1979Tunnels in Semiconductor Epitaxy
1978Calculations of the Effect of Emitter Compensation on β and fT of Bipolar Devices
1978Characterization of Electron Traps in Aluminum-Implanted SiO2
1978Electronic Properties of (100) Surfaces of GaSb and InAs and Their Alloys with GaAs
1978Growth of Polycrystalline GaAs for Solar Cell Applications
1978Location of Trapped Charge in Aluminum-Implanted SiO2
1978Low Cost Silicon for Solar Energy Conversion Applications
1978Novel Materials and Devices for Sunlight Concentrating Systems
1978Variational Principles for Semiconductor Device Modeling with Finite Elements
1978X-Ray Photoelectron Spectroscopy of SiO2–Si Interfacial Regions: Ultrathin Oxide Films
1973Digital-to-analog Converter having Common-mode Isolation and Differential Output
1961Theoretical Current Multiplication of a Cylindrical Hook Collector