 2006 | Optimizing CMOS technology for maximum performance |
| 2006 | Ultralow-voltage, minimum-energy CMOS |
| 2005 | Development of next-generation system-on-package (SOP) technology based on silicon carriers with fine-pitch chip interconnection |
| 2002 | Beyond the conventional transistor |
| 2002 | Maintaining the benefits of CMOS scaling when scaling bogs down |
| 2002 | New insights into carrier transport in n-MOSFETs |
| 2002 | Why BiCMOS and SOI BiCMOS? |
| 2000 | The future of CMOS technology |
| 1999 | Cost-effective cleaning and high-quality thin gate oxides |
| 1999 | Growth and characterization of ultrathin nitrided silicon oxide films |
| 1999 | Plasma-assisted oxidation, anodization, and nitridation of silicon |
| 1999 | Plasma-etching processes for ULSI semiconductor circuits |
| 1999 | Scaling the gate dielectric: Materials, integration, and reliability |
| 1998 | Photoelectrochemical etching of semiconductors |
| 1995 | Atomic force microscopy studies of SiGe films and Si/SiGe heterostructures |
| 1995 | Probing electrical transport, electron interference, and quantum size effects at surfaces with STM/STS |
| 1966 | Dislocation-Induced Deviation of Phosphorus-Diffusion Profiles in Silicon |
| 1965 | Observations of “Clean” Surfaces of Si, Ge, and GaAs by Low-Energy Electron Diffraction |
| 1965 | Vapor-Phase Polishing of Silicon with H2–HBr Gas Mixtures |
| 1964 | Calculation of the Capacitance of a Semiconductor Surface, with Application to Silicon |
| 1964 | Carrier Surface Scattering in Silicon Inversion Layers |
| 1964 | Chemical and Ambient Effects on Surface Conduction in Passivated Silicon Semiconductors |
| 1964 | Effect of Low Temperature Annealing on the Surface Conductivity of Si in the Si–SiO2–Al System |
| 1964 | Effect of Temperature and Bias on Glass-Silicon Interfaces |
| 1964 | Electrochemical Phenomena in Thin Films of Silicon Dioxide on Silicon |
| 1964 | Space-Charge Model for Surface Potential Shifts in Silicon Passivated with Thin Insulating Layers |
| 1964 | Stabilization of SiO2 Passivation Layers with P2O5 |
| 1964 | Surface Effects on Silicon: Introduction |
| 1964 | The Equilibrium Behavior of the Silicon–Hydrogen–Chlorine System |
| 1961 | Acoustic-Mode Mobilities for “Split-p-Silicon” |
| 1960 | Epitaxial Growth of Silicon |
| 1960 | Impurity Introduction during Epitaxial Growth of Silicon |
