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IBM Journal of Research and Development  
Volume 32, Number 4, Page 462 (1988)
Mesoscopic Phenomena and Nanolithographic ...
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Nanostructure technology

by T. H. P. Chang, D. P. Kern, E. Kratschmer, K. Y. Lee, H. E. Luhn, M. A. McCord, S. A. Rishton, Y. Vladimirsky
The ability to fabricate structures with lateral dimensions in the sub-100-nm range has opened a new field of research. This paper first reviews recent advances in nanolithography techniques, with a brief discussion of their relative merits and fundamental limits. Special emphasis is given to the scanning electron-beam method, which is the most widely used nanolithography method at the present time. The two main areas of nanostructure research are device technology and basic science. Highlights of a number of exploratory programs in these two areas are presented.
Related Subjects: Lithography, Electron-beam