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IBM Journal of Research and Development  
Volume 20, Number 4, Page 376 (1976)
Nontopical Issue
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Scanning Electron Beam Lithography for Fabrication of Magnetic Bubble Circuits

by T. H. P. Chang, M. Hatzakis, A. D. Wilson, A. J. Speth, A. Kern, H. Luhn
A high-resolution technique is described for the experimental fabrication of Permalloy patterns for magnetic bubble circuits having linewidths as small as 3000 Å The system includes a computer-controlled electron beam, automatic registration, a modified field-stitching method, and exposure control to compensate for proximity effects. Patterns are formed either by electroplating or by evaporation. The system can be used either for directly writing on bubble wafers or for fabricating masks for x-ray or conformable-mask printing.
Related Subjects: Beams, charged particle; Lithography; Magnetic bubble technology; Storage (computer) devices and systems